MATEC Staff & Industry Partners

MATEC was launched in 1996 based on an initial $5M / 6-year grant from National Science Foundation (NSF) to develop a national center for education and development in the semiconductor manufacturing and related industries. In late 1996 the Center's first employee, Executive Director Dr. Michael Lesiecki, was hired. MATEC provides education and industry collaboration, supporting the ongoing development of a highly skilled workforce. With its partners in education and industry, MATEC develops programs, materials, and training that enable students, faculty, and semiconductor industry technicians to continuously master the evolving competencies in science, mathematics, technology, and communications required by the workforce of the semiconductor, automated manufacturing, and electronics industries.

Through the creation of competency-based curricula, diverse and effective professional development training and opportunities, and replicable workforce/program development models and offerings, MATEC affects change in the field of Semiconductor Manufacturing Technology (SMT) education. MATEC’s materials and services are developed based on collaborative efforts between education and industry, working through a close and responsive partnership between the public and private sector. As the need for more highly skilled technicians in the semiconductor manufacturing field grows, MATEC has positioned itself to continue to be the leader in SMT technician education and industry collaboration. Semizone and MATEC have established a long-range educational and training alliance in order to repurpose and deliver MATEC’s comprehensive SMT curricula through Semizone’s global online learning infrastructure.

Dr. Andre Anders is the group leader of the Plasma Application Group and Principal Investigator at Lawrence Berkeley National Laboratory (LBNL), Berkeley, California. He studied physics in Wroclaw, Poland, Berlin, Germany, and Moscow, Russia. He holds an M.S. degree ('84) and Ph.D. degree ('87) in physics from Humboldt University, Berlin. He was a Staff Scientist at the Academy of Sciences in Berlin (1987-1991) and has been affiliated with LBNL since 1992. His research includes vacuum arc plasma and ion sources, gas plasma sources, ion implantation, plasma immersion ion implantation, and thin film synthesis. He is the author of A Formulary for Plasma Physics  (Berlin: Akademie-Verlag, 1990), the editor and co-author of the Handbook of Plasma Immersion Ion Implantation and Deposition (New York: Wiley, 2000).  He has published more than 100 papers in refereed journals. He served as a co-chair of the XVIIth International Symposium on Discharges and Electrical Insulation (ISDEIV, 1996) and was a Guest Editor of IEEE Transactions on Plasma Science (1997). In 1997 and 1998 he was LBNL?s program manager for IPP, a DOE-sponsored Non-Proliferation Program.  He is the Secretary of the Permanent International Scientific Committee of ISDEIV.  He received the Chatterton Award (1994) for a laser-based plasma diagnostics system for vacuum arc cathode spots and an R&D 100 Award (1997) for the development of the Constricted Plasma Source. He is a member of MRS, AVS, SVC and IoP (UK); he was elected Fellow of IEEE in 2001.

And he loves sailing on and flying over the San Francisco Bay.

Air Academy Associates is a leading-edge Six Sigma quality management consulting firm which provides innovative consulting and training services, public workshops, statistical publications, training aids, textbooks, and software to a variety of clients worldwide. Since its creation in 1990, the company has become a leader in Six Sigma training focusing on the areas of Knowledge Based Management, Statistical Process Control, Design of Experiments, Design for Six Sigma, and other Advanced Problem Solving Tools. Air Academy Associates is recognized for its ability to help leadership improve customer satisfaction and increase business profitability.

Michael Barr Michael Barr is an expert on the design of embedded computer systems. In that role, he has provided expert witness testimony in federal court, appeared on PBS’ American Business Review, and been quoted in various newspapers. He is also the author of two books and more than forty articles on related subjects. In addition, software he wrote helps power millions of products, ranging from consumer electronics to medical devices.

For three and a half years Michael served as editor-in-chief of Embedded Systems Programming magazine. In addition, Mr. Barr has been a member of the advisory boards of the Embedded Systems Conference and a pair of silicon valley startups. Mr. Barr is currently president of Netrino. He holds an MBA as well as BS and MS degrees in electrical engineering from the University of Maryland.

Mark Bauer is a Senior Principal Engineer in the Flash Products Group at Intel Corporation. He received his B.S.E.E. from the University of California, Davis in 1985. He joined Intel's Memory Components Division that same year, working on EPROM design. In 1992, he went on to work on Flash memory design. In 1993 he was responsible for circuit design and technology development of the first Intel StrataFlash™ memory. He is presently a Senior Principal Engineer in Intel’s Flash Memory Group working on advanced circuit design and memory technology development. Mr. Bauer has been a member of the IEEE International Solid-State Circuit’s Conference memory sub-committee since 1999.

Mr. Bauer holds 20 patents in the field of non-volatile memories and has authored several technical papers, one of which received the Lewis Award for Outstanding Paper at the IEEE International Solid State Circuits Conference.

Prof. Stephen P. Beaudoin has been on the faculty in Chemical Engineering at Arizona State University since 1995. He obtained his B.S. in 1988 from MIT, his M.S. in 1990 from the University of Texas at Austin, and his Ph.D. in 1995 from North Carolina State University, all in Chemical Engineering. Beaudoin's group performs basic research with a goal of developing environmentally-benign semiconductor manufacturing processes, including projects in chemical-mechanical polishing (CMP) and post-CMP cleaning, particle and thin-film adhesion, and the processing of polymer dielectrics. He is Chair of the Fundamentals Section of the Environmental Division of the American Institute of Chemical Engineers, and is President of the Arizona Chapter of the American Vacuum Society. Students under Professor Beaudoin's direction have won numerous awards from the American Institute of Chemical Engineers and the American Vacuum Society. Prof. Beaudoin is a recipient of an NSF CAREER Award. Prof. Beaudoin is now with Purdue University.

Dr. Maximilian A. Biberger is the President and Chief Operating Officer of Supercritical Systems Inc (SSI) in Fremont, CA., a wholly owned subsidiary of Tokyo Electron Limited (TEL). In this role he is responsible for the development of wafer cleaning technologies using supercritical CO2. Biberger joined SSI in September 1999. Prior to that, he was the Director of Technology at Novellus Systems in San Jose, CA, which he joined in May 1997. At Novellus he was responsible for the process development of all PVD and PVD / CVD integrated metal processes. He was also responsible for the development of pre-clean technologies prior to the metal deposition, the demonstration and applications lab, microcontamination as well as the integration of low k materials with PVD / CVD metals. Prior to joining Novellus Systems Biberger was Manager for Process Development at Varian Thin Film Systems in Palo Alto, CA, from March 1992 to April 1997. Biberger received is MS and Ph.D. in Materials Science and Solid State Physics from the University of Erlangen - Nuremberg (Germany) in 1986 and 1989, respectively. After his Ph.D. Biberger spend two years as a post-doctoral fellow at the University of California in Davis, CA. Biberger has published numerous technical papers ranging from micro-structural characterization of metals to thin film deposition. Biberger has been awarded two patents and has several pending.

Prof. Duane Boning is currently the Robert N. Noyce career development Associate Professor of Electrical Engineering and Computer Science at MIT, and is Associate Director of the MIT Microsystems Technology Laboratories. His research focuses on variation modeling, sensors, control, and environmental issues in semiconductor processes, with special emphasis on chemical mechanical polishing and plasma etch. Additional interests include CAD tools for process and device design, and computer integrated manufacturing. He is an Associate Editor for the IEEE Transactions on Semiconductor Manufacturing. His degrees are all from MIT in electrical engineering and computer science, culminating in the Ph.D. degree in 1991. From 1991 to 1993 he was a Member of the Technical Staff at Texas Instruments in Dallas, where he worked on process/device simulation tool integration, semiconductor process representation, and statistical modeling and optimization.

Prof. Ahmed A. Busnaina is the William Lincoln Smith Professor and Director of the Microcontamination Research Laboratory at Northeastern University. He specializes in wafer cleaning technology, chemical and particulate contamination in semiconductor processes, particle adhesion and removal, submicron particle transport, deposition and removal in clean environments. He authored more than 200 papers in journals, books, proceedings and conferences. He taught 45 short courses for semiconductor manufacturing worldwide. He organized 20 symposia and programs, chaired and organized more than 70 sessions and panels for many professional societies worldwide. Many companies including IBM, Intel, SEMATECH, Praxair, Kodak, Asyst, IPEC, Verteq, Branson, Crest, PCT, etc funded his research. He also consults for several companies such as IBM, Motorola, Eaton, Seagate, GE, GM, DuPont, Corning, Crest, Kodak, Xerox, Zimmer, Lawrence Livermore National Laboratory, etc. He serves on the editorial advisory board of the Semiconductor International Magazine, the Journal of Particulate Science and Technology and the Journal of Environmental Sciences. He a Fellow of the American Society of Mechanical Engineers and the Adhesion Society, a Fulbright Senior Scholar, the Best Paper Award from ASME_, John W. Graham Faculty Research Award, Dow Outstanding Young Faculty Award, Ralph R. Teetor National Educational Award and numerous Who's Who listings (including Who's Who in the World, Who's Who in America, Who's Who in Science and Engineering, etc.)

Dr. Dennis Buss is the Vice President of Silicon Technology Development at Texas Instruments Incorporated with responsibility for Technology Computer Aided Design (TCAD) and is the chairman of TI’s Technical Ladder Policy Board (TLPB).

Dennis began his industrial career at Texas Instruments in July 1969. During the next 18 years, Dennis was TI Fellow and later Vice President and Director of TI's Semiconductor Process and Design Center.

Between 1987 and 1997, Dennis was Vice President of Technology at Analog Devices. He returned to Texas Instruments in December 1997.

Dennis received his BS, MS and Ph.D. in Electrical Engineering from MIT in 1963, 1965 and 1968. He served twice on the Electrical Engineering faculty at MIT in 1968-1969 and 1974-1975. He is an IEEE Fellow and the recipient of the 1985 Herschel Award and the 1987 Jack A. Morton Award for his pioneering work on HgCdTe Infra-Red monolithic focal plane technology. In February 2000, Dennis was selected by the Electron Devices Society to be one of the recipients of an IEEE Third Millennium Medal.

Dr. Jeffery W. Butterbaugh is Director of Surface Conditioning Division Applications Engineering at FSI International. Since joining FSI International in 1993 he has led process development for photochemical wafer cleaning technology, anhydrous HF wafer cleaning and cryokinetic aerosol wafer cleaning. Prior to joining FSI, Dr. Butterbaugh worked as a plasma etch development engineer for IBM in Burlington, Vermont. He received his Ph.D in Chemical Engineering from MIT and his B.S. in Chemical Engineering from the University of Minnesota. He holds 7 U.S. Patents and has authored or co-authored over 20 papers on plasma etching and surface conditioning.

Robert Carlson

Prof. Kyeongjae Cho is an Assistant Professor of Mechanical Engineering at Stanford University. He received his B.S. and M.S. dgrees in Physics from Seoul National University, Korea, in 1986 and 1988, respectively. Prof. Cho received his Ph.D. degree in Physics from MIT in 1994. Prof. Cho’s research interests are focused on computational engineering of nanomaterials mechanics using large-scale computer simulations. He uses atomistic simulation programs (both quantum and classical interatomic potentials) to perform computational experiments in virtual design space to study the relationship between mechanical properties and atomic structures of diverse materials including carbon nanotubes, electronic materials, and biomaterials. For a rigorous and systematic study, he is also developing multiscale simulation tools, which can efficiently combine the ab initio, atomistic, and continuum methods.

Dr. Lawrence Comstock

Dr. Michael Current has been active in the use of ion beams for modification and analysis of materials for over 25 years in research, process engineering and technical marketing positions at Silicon Genesis, Applied Materials, Kyoto University, Xerox Palo Alto Research Center, Trilogy Systems, Signetics/Philips, Cornell University and Rensselaer Polytechnic Institute. Dr. Current received his PhD in solid-state physics from RPI, is the author of over 140 publications and was the founding president of the Greater Silicon Valley (Ion) Implant Users Group (GSVIUG).

Among the technology initiatives that Dr. Current has contributed to are: characterization of dose uniformity effects in the first generation of high current implanters, early applications of high-energy (>1MeV) implantation for control of latch-up in CMOS devices, development of Plasma Immersion Ion Implantation, applications of cluster and molecular ion beams for deposition of epitaxial Al layers on Si and doping of ultra-shallow junctions, development of techniques to measure and model beam-plasma current-voltage characteristics for control of charging effects during implantation, process characterization of sub-keV B implants and rapid thermal annealing for ultra-shallow junctions and development of practical techniques for fabrication and characterization of SOI wafers using implantation and CVD film growth and modification. Dr. Current is an active member of the Starting Materials and Thin Film/Doping working groups of the International Technology Roadmap for Semiconductors (1994 to present) and is the USA chairman of the SEMI Standards sub-committee for SOI wafers.

Prof. Giovanni De Micheli is Professor of Electrical Engineering, and by courtesy, of Computer Science at Stanford University. Previously he held positions at the IBM T.J. Watson Research Center, Yorktown Heights, New York, at the Department of Electronics of the Politecnico di Milano, Italy and at Harris Semiconductor, Melbourne, Florida. He holds a Nuclear Engineer degree (Politecnico di Milano, 1979), a M.S. and a Ph.D. degree in Electrical Engineering and Computer Science (University of California at Berkeley, 1980 and 1983). His research interests include design technologies for integrated circuits and systems, with particular emphasis on synthesis, system-level design, hardware/software co-design and low-power design. He is author of: Synthesis and Optimization of Digital Circuits, McGraw-Hill, 1994, co-author and/or co-editor of five other books and of over 250 technical articles .

Dr. De Micheli is the recipient of the 2003 IEEE Emanuel Priore Award for contributions to computer-aided synthesis of digital systems. He is a Fellow of ACM and IEEE. He received the Golden Jubilee Medal for outstanding contributions to the IEEE CAS Society in 2000. He is President of the IEEE CAS Society. He was Editor in Chief of the IEEE Transactions on CAD/ICAS in 1987-2001. He is a founding member of the ALaRI institute at Universita' della Svizzera Italiana (USI), in Lugano, Switzerland, where he is currently scientific counselor.

Prof. Jesus A. del Alamo received the degree of Telecommunications Engineer from the Polytechnic University of Madrid in 1980, and the MS and PhD degrees in Electrical Engineering from Stanford University in 1983 and 1985, respectively.

From 1977 to 1981 he was with the Institute of Solar Energy of the Polytechnic University of Madrid, working on silicon solar cells. At Stanford University he carried out his PhD dissertation on minority carrier transport in heavily doped silicon. From 1985 to 1988 he was research engineer with NTT LSI Laboratories in Atsugi (Japan) where he conducted research on III-V heterostructure field-effect transistors. Since 1988 he has been with the Department of Electrical Engineering and Computer Science of Massachusetts Institute of Technology where he is currently Professor. His current research interests are on Gigahertz power transistors: Si LDMOS on SOI, GaAs PHEMTs and InP HEMTs.

At MIT, Prof. del Alamo teaches undergraduate and graduate subjects on basic electronics, electronic devices and circuits, and integrated microelectronic devices. Prof. del Alamo is writing a textbook titled "Integrated Microelectronic Devices: Physics and Modeling." He is also developing a web-enabled remote characterization laboratory for microelectronic devices called the "MIT Microelectronics WebLab".

From 1991 to 1996, Prof. del Alamo was an NSF Presidential Young Investigator. In 1992 he was awarded the Baker Memorial Award for Excellence in Undergraduate Teaching at MIT. In 1993 he received the H. E. Edgerton Junior Faculty Achievement Award at MIT. In 1999 he was elected a corresponding member of the Spanish Academy of Engineering.

Dr. Alain Diebold is an International SEMATECH Senior Fellow and an AVS Fellow. He co-manages the Metrology Yield Management Tools Program providing technical management. He is a member of the International Metrology Technical Working Group and founder and co-chair of the US Metrology Technical Working Group for the 2001 International Technology Roadmap for Semiconductors. The main focus of his activities include development of new metrology methods and metrology industry coordination. He is founder and leader of the Metrology Council and Analytical Laboratory Managers Working Group of the International SEMATECH member companies. Dr. Diebold has edited or co-edited several books, and he is editor of the Metrology section of Future FAB International. He is chair of the Manufacturing Science and Technology Group (MSTG) of the American Vacuum Society. Prior to joining SEMATECH, Dr. Diebold was a senior chemist where he worked at Allied Signal in the areas of molecular beam epitaxy of III-V compounds and materials characterization of a broad range of semiconductor and amorphous metal products.

ESH Connect Faculty

Various Faculty

Stanford Advanced Project Management Faculty

Diane E. Bailey is Assistant Prof. of Management Science & Eng. (MS&E) at Stanford. Her research focuses on technical work & workplaces. Her doctoral study of teams in semi mfg. yielded an IEEE best paper award & the Institute of Industrial Engineers Award.

Stephen R. Barley is a Prof. of MS&E & Co-Director of the Center for Work, Technology, & Organization at Stanford. He is an expert on the impact of new technologies on work, the organization of technical work, & organizational culture.

Robert Carlson is a Prof. of MS&E & the Graduate School of Business (GSB). His research focuses on the creation of analytical models of production scheduling & control systems, distribution & plant location systems, & multi-objective decision systems.

Jennifer Chatman is a Prof. the Haas School of Business at UC Berkeley. Prior to UCB, she was on the faculty of the Kellogg Graduate School of Management. Her work focuses on the advantages of leveraging organizational culture & leading change.

Dr. Jay Galbraith is Prof. of Management & Organization at USC. His articles include: "Tomorrow's Organization: Crafting Winning Capabilities in a Dynamic World" & "Designing Organizations: An Executive Briefing on Strategy, Structures & Process."

Warren H. Hausman is Prof. of MS&E at Stanford. He specializes in supply chain management & operations management. He has taught in numerous executive education programs. He is a Fellow of INFORMS, The Institute for Operations Research & the Management Sciences.

Pamela Hinds is an Assistant Prof. of MS&E, & the Center for Work, Technology, & Organization at Stanford. Her research focuses on the effect of geographic distribution on work, teams, cognitive & motivational inhibitors to using & sharing expertise, & workers’ social & cognitive responses to autonomous agents.

Hau L. Lee is Prof. of Operations, Information & Technology at the GSB. He is also the director of the Stanford Global Supply Chain Management Forum. He specializes in supply chain coordination, design for supply chains, & e-businesses.

Raymond Levitt (Academic Director), is a Prof. of Civil & Environmental Eng. at Stanford. He has worked with global companies in the design of project/matrix organization structures, work processes, & IT applications to support project work. His work focuses on modeling & simulating the significant institutional costs that can arise in global projects.

William A. Malek(Curriculum Director) IPS Associates, Inc., has 20+ years of experience in project, program, & portfolio management, as well as extensive business consulting with a focus on the successful planning & launching of new products & services.

Debra Meyerson is Associate Prof. of Education & Organizational Behavior at Stanford’s School of Education & the GSB. Her research focuses on change strategies in organizations & the leadership conditions that support experimentation & professional learning.

Mark Morgan, IPS Associates, Inc., has 25 years of experience in project & program management, including a 13-year career at IBM spanning both hardware & software initiatives. He has developed processes for the use of collaboration tools in managing distributed teams.

Elisabeth Paté-Cornell is the Burt & Deedee McMurtry Prof. & Chair of MS&E. Her research focuses on engineering risk analysis & risk management, decision analysis, & engineering economy.

Robert Sutton is a Prof. of MS&E & the GSB, & Co-Director of the Center for Work, Technology, & Organization at Stanford. He has consulted to many companies worldwide. He has authored The Knowing_Doing Gap & the award-winning 11 1/2 Weird Ideas That Work.

Russ Zinser is VP of Education for IPS Associates, Inc. He has over 30 years of experience in project, program, & portfolio management, & has created & delivered customized project-management courseware for many IPS clients.

Woodrow D. Farrow is currently president of Farrow & Associates, Inc.: a training, sales, and service company headquartered in Texas and serving an international customer base. Prior to Farrow & Associates, he served as General Manager of Kashiyama-USA, Inc. for seven years. In that position, he was responsible for introduction, sales, and service of Kashiyama vertical screw pumps to the U.S.A. & European markets. He served as a Product Manager at Stokes Vacuum for five years, responsible for the introduction of a Japanese-made trilobe dry vacuum pump to the U.S. market for semiconductor and chemical applications. For two years, he was the Semiconductor Applications Specialist at BOC\Edwards, responsible for blowers and vacuum pump semiconductor applications with particular attention to OEM's. He received his Bachelor of Arts degree in 1973 from Trenton State College and Associates of Arts degree from Burlington County College, both in NJ.

Dr. Thomas Fister received a Ph.D. in Analytical Chemistry from the University of North Carolina at Chapel Hill. He did a 1 year post doc at the University of California at Irvine. He has been with Charles Evans & Associates since 1995. The first four years were devoted to research activities in the environmental and biotech fields using Time-of-Flight Secondary Ion Mass Spectrometry. More recently, he has been part of the X-ray Photoelectron Spectroscopy (XPS/ESCA) group, where he is the group manager.

Prof. Michael J. Flynn received his Ph.D. from Purdue University in 1961. He joined IBM in 1955 and for ten years worked in the areas of computer organization and design. He was design manager of prototype versions of the IBM 7090 and 7094/II, and later for the System 360 Model 91 Central Processing Unit. Between 1966 and 1974 Prof. Flynn was a faculty member of Northwestern University and the Johns Hopkins University. In 1975 he became Professor of Electrical Engineering at Stanford University, and was Director of the Computer Systems Laboratory from 1977 to 1983. He was founding chairman of both the ACM Special Interest Group on Computer Architecture and the IEEE Computer Society's Technical Committee on Computer Architecture. Prof. Flynn was the 1992 recipient of the ACM/IEEE Eckert-Mauchley Award for his technical contributions to computer and digital systems architecture. He was the 1995 recipient of the IEEE-CS Harry Goode Memorial Award in recognition of his outstanding contribution to the design and classification of computer architecture. In 1998 he received the Tesla Medal from the International Tesla Society (Belgrade), and an honorary Doctor of Science from Trinity College (University of Dublin), Ireland. He is the author of three books and over 250 technical papers.

Dr. Abe Ghanbari is Vice President of engineering at Dielectric Systems, Inc. He has 18 years of extensive management experience in semiconductor processing equipment industry. He is recognized in his field for innovation in plasma technologies and product development. Dr. Ghanbari is widely published and has been granted more than 6 patents. He has lectured extensively worldwide, including an invitation under the National Academy of Sciences/National Research Council. He served as an advisor to the National Science Foundation for the Engineering Centers. Also as a consultant to the industry, he was responsible for several technology evaluations including business and market directions for merger and acquisitions of high-tech companies. Dr. Ghanbari served as chairman of SPIE ‘s conferences on Semiconductor Device Manufacturing and Reliability. In addition, he recently served as chairman of the local arrangement committee for the American Vacuum Society (AVS). In the past 15 years, he has been a regular short course lecturer at AVS symposiums, teaching plasma diagnostics, ion sources and beam technologies. He is currently a faculty at SemiZone, Inc., a company dedicated to providing on-line education and training for semiconductor and related industries. He is a member of the AVS, APS, IEEE, and SPIE.

Dr. Ghanbari’s prior experience includes senior corporate R&D and product development management roles in Varian, Veeco, Materials Research (Sony), and Applied Materials (Etec) Corporations. He also founded Plasma Aided Reactor Systems (PARS), Inc to develop equipment for etching and depositing thin film materials for semiconductor applications. Before joining DSI, he was Vice President of Extreme Ultra Violet Lithography (EUVL) mask development at Rodel. Inc.

Dr. Ghanbari received a Bachelor of Science degree in Electrical Engineering, Master of Science degree in Plasma Science from University of Illinois, and a doctoral degree in Applied and Engineering Physics (Plasma/Atomic) from Cornell University. He also holds a MBA from Saint Mary’s University.

Prof. David B. Graves is currently Professor of Chemical Engineering at UC Berkeley. He joined the department in 1986 after receiving the PhD in Chemical Engineering from the University of Minnesota. His research interests are in the general areas of plasma processing science and gas discharge phenomena. Professor Graves and his group have employed both experimental and modeling approaches in their studies of plasmas. Recent efforts have focused on plasma-surface interactions using vacuum beam systems and molecular dynamics simulations; radical-enhanced atomic layer deposition; reactor-scale and feature-profile-scale simulations of chemically active plasmas; experimental diagnostics of inductively coupled plasmas; high pressure micro-glow discharge plasmas; surface treatments of polymer and elastomer materials; and various studies of environmentally benign plasma processing. Professor Graves chaired the 2000 Plasma Processing Science Gordon Research Conference and has served on numerous national and international conference organizing committees.

Prof. Peter S. Gwozdz is the Director of the Center for Electronic Materials and Devices at San Jose State University (SJSU). Professor Gwozdz teaches courses primarily in the field of Integrated Circuit (IC) Processing, in the departments of General Engineering, Chemical and Materials Engineering, and Electrical Engineering. Peter manages the IC Labs at SJSU through the Center.

Prof. Gwozdz has held more than 100 sessions of a three day Laboratory Short Course on microfabrication in the IC Labs. The short course is attended by industry professionals from all over the world. SEMI sponsors a version of this short course, taught by Gwozdz, at the SEMICON conventions held in San Francisco, Austin, Boston, Munich, and Singapore. Prof. Gwozdz also teaches this course in-house for industry companies. The SemiZone series of courses is adapted from these courses that Pete does for industry.

Peter's Ph.D. in Physics, from the University of Illinois, was on defects in Silicon, 1973. Before joining San Jose State in September, 1988, he spent fifteen years in the local "Silicon Valley" semiconductor industry, including at AMD from 1980 through 1988. Prof. Gwozdz is still active in industry, part time, as a consultant. Pete's hobby is Polish genealogy.

Prof. James S. Harris James and Ellenor Chesebrough Professor of Electrical Engineering, Materials Science and Applied Physics

James S. Harris received B.S., M.S. and Ph.D. degrees in Electrical Engineering from Stanford University in 1964, 1965 and 1969, respectively. He is currently the James and Ellenor Chesebrough Professor of Electrical Engineering and Professor of Applied Physics and Materials Science. He is Director of the Joint Services Electronics Program and Principal Investigator for the US-Japan Technology Management Center at Stanford University. He served as Director of the Solid State Electronics Laboratory from 1984-1997.

In 1969, Dr. Harris joined the Rockwell International Science Center in Thousand Oaks, CA where he initiated much of their work on III-V compound semiconductors. He was one of the key contributors in developing ion implantation in GaAs, MBE and heterojunction device technologies, leading to Rockwell's preeminent position in GaAs device technology. He was successively Manager of Infra-red devices, Principal Scientist and Director of the Optoelectronics Research Department. In 1982, Dr. Harris joined the Solid State Electronics Laboratory, Stanford University, as Professor of Electrical Engineering to establish a program in compound semiconductor materials and heterojunction devices. His current research interests are in the development of new artificially structured materials, nano and micro fabrication techniques for the development of new optoelectronic and electronic devices for ultra- high-speed integrated circuits and optical networks. He has recently initiated development of novel fabrication techniques with MBE for investigation of single electron devices exhibiting Coulomb blockade and spin polarization.

Professor Harris has served on numerous organizing and program committees for the IEEE IEDM, International Symposium on Compound Semiconductors (formerly GaAs and Related Compounds), International Molecular Beam Epitaxy Conference and he has been the Conference Chair for the Advanced Heterostructure Transistor Conference and the U.S. Molecular Beam Epitaxy Conference. He has served as Divisional Editor of the Journal of Electrochemical Society and on the editorial boards for Solar Cells and Materials Research Bulletin. He is the recipient of the 2000 IEEE Morris N. Liebmann Award for contributions to GaAs devices as an emerging technology, an IEEE Third Millennium Medal, the International Symposium on Compound Semiconductors Award and Welker Medal, and an Alexander von Humboldt Foundation Senior Research Prize. He is a Fellow of the IEEE and the American Physical Society and Visiting Professor and Research Fellow, Kochi University of Technology, Japan. He has supervised the research of over 60 Ph. D. students, published more than 500 papers, 4 book chapters and holder of 7 issued patents on heterojunction high speed transistors, optoelectronics devices, quantum effect devices, compound semiconductor materials and molecular beam epitaxy.

Dr. Albert Henning received the A.B. and A.M. degrees from Dartmouth College in Physics in 1977 and 1979, respectively. From 1979 to 1982 he was a device physicist with Intel Corporation, where he led the initial CMOS device physics and transistor designs for the 386 generation of microprocessors. He received his Ph.D. in Electrical Engineering from Stanford University in 1987, studying hot carrier MOSFET physics at cryogenic temperatures. From 1987 through 1995, he was Assistant and Associate Professor of Engineering Science at Dartmouth College, working on semiconductor device physics (including MEMS-based scanning probe metrology of MOSFET doping profiles and defects), and beginning his research into microflow devices, such as micro-scale channels and orifices, and microvalves and microturbines. At Dartmouth, he also developed an NSF-sponsored undergraduate course on MEMS, and a summer workshop on MEMS for minority students. In 1996 he joined Redwood Microsystems, where he is presently Director of Technology. His research interests concern the physics and technology of microflow structures and systems, particularly with respect to valves, orifices, and pressure sensors. He is active in the IEEE, and the MEMS-related SPIE conferences.

Dr. Michael Heynes earned his Ph.D. in physical chemistry at the University of London with research on silicates and a bachelor’s degree in chemistry from the University of Birmingham, England. In his first job in the semiconductor industry, he worked at Shockley Transistor and subsequently held a series of senior engineering and management positions in semiconductor technology development and manufacturing. His experience includes development of diffusion, chemical vapor deposition and plasma etch processes for silicon and some gallium arsenide products. He has held responsibility at several companies for complete process integration and product development for MOS and for bipolar devices. In recent years, Dr. Heynes has worked at Lam Research, writing and teaching substantial sections of Lam’s Training Department`s process training material and with Semiconductor Services on various training and technical publication projects

Bill Hulsey

Mr. William N. Hulsey III With a highly-developed specialty in electronics, aeronautical and astronautical sciences and technologies, Bill Hulsey applies his 20 years of experience and achievements in protecting and licensing clients' IP through U.S. and international patents, trademarks, copyrights, licensing, and enforcement proceedings. He has drafted and prosecuted more than 650 patent applications. In addition, he has developed and implemented complete IP protection and licensing programs for numerous companies. Bill served as a principal outside intellectual property legal counsel for Lockheed Martin Tactical Aircraft Systems during major phases of Joint Strike Fighter (F-35) competition with Boeing Aerospace. Through this work and representing other aviation and aerospace companies, he possesses a specialty in aerospace and aeronautics technology commercialization and related IP legal and business aspects.

Mr. Hulsey has expertise in general business and legal counseling and negotiation for clients, including various start-up and emerging growth companies. He has negotiated and settled IP ownership disputes, such as one between one of the nation's largest telecommunications service providers and one of the world's largest manufacturers of telecommunications switching equipment. He has also played a leading role in patent litigation involving eight patents owned by one of the nation's largest integrated circuit manufacturers against one of the nation's largest personal computer manufacturers.

Bill has prosecuted and led infringement analysis efforts for fundamental, industry-defining patents protecting the market position of an Internet infrastructure company which, at the time of going public, generated the fourth greatest immediate share price rise in history. He has also established numerous intellectual property protection programs, including one for a newly public electronic commerce company having a market valuation of over $20 billion.

Mr. Hulsey has been recognized as an outstanding speaker and writer on IP matters as they relate to space and aerospace technologies, particularly as such concerns affect our nation’s Vision for Space Exploration articulated in 2004 by President George W. Bush and now being pursued by the U.S. and international commercial space industries.

Dr. Igor Ivanov is the Founder and Chief Technology Officer of Blue 29, Inc. (currently a division of KLA Tencor), a supplier of electrochemical deposition (ECD) equipment. Prior to Blue 29, Dr. Ivanov held industrial positions at various companies in the semiconductor manufacturing and related areas, including: Mattson Technology, CuTek Reseach, Advanced Micro Devices (AMD), and Charles Evans & Associates. Dr. Ivanov received his M.S. and Ph.D. degrees in Chemistry and Physics from St. Petersburg University. He has produced over 50 publications and 4 issued patents. Dr. Ivanov is a world-renowned expert in integrated circuit interconnect technologies as well as electrochemical deposition (ECD) processes and applications.

Dr. Ted Kamins is Principal Scientist in the Quantum Science Research group at Hewlett-Packard Laboratories in Palo Alto, California, where he is conducting research on advanced nanostructured electronic materials and devices. He is also a Consulting Professor in the Electrical Engineering Department at Stanford University. He received his degrees from the University of California, Berkeley. He then joined the Research and Development Laboratory of Fairchild Semiconductor, where he worked with epitaxial and polycrystalline silicon before moving to Hewlett-Packard. Ted is co-author with R. S. Muller of the textbook "Device Electronics for Integrated Circuits" and is author of the book "Polycrystalline Silicon for Integrated Circuits and Displays." He is a Fellow of the IEEE and a Fellow of the Electrochemical Society and received the 1989 Electronics Division Award of the Electrochemical Society. He has also taught at the University of California, Berkeley, and at Stanford University. He has been an Associate Editor of the IEEE Transactions on Electron Devices and has presented short courses for the University of California, Oxford University, the IEEE, the American Vacuum Society, and SEMI.

Prof. Butrus T. Khuri-Yakub was born in Beirut, Lebanon. He received the B.S. degree in 1970 from the American University of Beirut, the M.S. degree in 1972 from Dartmouth College, and the Ph.D. degree in 1975 from Stanford University, all in electrical engineering. He joined the research staff at the E. L. Ginzton Laboratory of Stanford University in 1976 as a research associate. He was promoted to a Senior Research Associate in 1978, and to a Professor of Electrical Engineering (Research) in 1982. He has served on many university committees such as graduate admissions, undergraduate academic council of the school of engineering, and others.

Prof. Khuri-Yakub has been teaching both at the graduate and undergraduate levels for over 15 years, and his current research interests include in-situ acoustic sensors (temperature, film thickness, resist cure, ...) for monitoring and control of integrated circuits manufacturing processes, micromachining silicon to make acoustic materials and devices such as air borne and water immersion ultrasonic transducers and arrays, and fluid ejectors, and in the field of ultrasonic nondestructive evaluation and acoustic imaging and microscopy.

Professor Khuri-Yakub is a fellow of the IEEE, a senior member of the Acoustical Society of America, and a member of Tau Beta Pi. He is associate editor of Research in Nondestructive Evaluation, a Journal of the American Society for Nondestructive Testing; and a member of the AdCom of the IEEE group on Ultrasonics Ferroelectrics and Frequency Control (1/1/94 - 1/1/97).

Professor Khuri-Yakub has authored over 300 publications and has been principal inventor or coinventor on over 50 patents. He received the Stanford University School of Engineering Distinguished Advisor Award, June 1987, and the Medal of the City of Bordeaux for contributions to NDE, 1983.

Dr. Mark Kiemele is the President and co-founder of Air Academy Associates. He has more than 30 years of teaching and consulting experience. Having trained, consulted, and mentored more than 25,000 leaders, scientists, engineers, managers, trainers, practitioners, and college students from more than 20 countries, he is world-renowned for his Knowledge Based KISS (Keep It Simple Statistically) approach to teaching statistical methods to practitioners. Dr. Kiemele has been involved in the origin and evolution of Six Sigma, as he trained the first Six Sigma Black Belts at the Six Sigma Research Institute at Motorola and has helped deploy and implement Six Sigma at more than 60 companies worldwide. In addition to many published technical papers, he has co-authored the books Basic Statistics: Tools for Continuous Improvement, Knowledge Based Management (KBM), Applied Modeling and Simulation: an Integrated Approach to Development and Operation, the AT&T Bell Labs book entitled Network Modeling, Simulation, and Analysis, and most recently Lean Six Sigma: A Tools Guide. He is also the editor of the text Understanding Industrial Designed Experiments.

Larry Knipp is currently with Advanced Energy Industries. He is also president of Nykar Technologies, which specializes in RF training, consulting, and custom devices for the thin film industry. After obtaining his Bachelors Degree from the University of Cincinnati, he designed computers and diagnostic equipment for IBM. He later joined Magnovox, where he developed radio frequency (rf) communications equipment for the US Military. In 1989 he went to work for Advanced Energy Industries, working as a design and an applications engineer, traveling to many fabs and OEM’s around the world to solve rf issues. In 1997 Larry Co-Founded Nykar Research Corporation, the predecessor to Nykar Technologies. Larry has a Masters of Science Degree in Electrical Engineering from Colorado State University and is the inventor of one patent.

James Kogler is a master Six Sigma consultant and award winning instructor with over twenty years of teaching and consulting experience. His extensive Six Sigma quality background involves applications of process control and process improvement techniques, to include Statistical Process Control and Design of Experiments in the manufacturing and transactional arenas. Mr. Kogler’s expertise lies in training practitioners to make their processes more efficient through proper application of experimental design. He has edited and reviewed textbooks in design of experiments and statistics. His clients include Lockheed Martin, Sony, General Electric, Cordis, Johnson Controls, and Woodward Governor, among others. Jim earned an undergraduate degree in Applied Mathematics from the U.S. Air Force Academy and a Masters Degree in Operations Research from Stanford University. He is a former Instructor Pilot and Assistant Professor of Mathematics at the U.S. Air Force Academy.

Dr. Jaques Kools is currently Vice President of Technology with Veeco Instruments. Dr Kools holds a Master’s degree in industrial physics and a teaching degree from Antwerp University in Belgium and a Ph.D. in Technical Physics from Eindhoven University of Technology in The Netherlands. Dr Kools has more than 17 years of experience in R&D on thin film processing, most notably on vacuum processing with an emphasis on metallic systems. He has authored more than 60 papers, including 8 invited reviews and book chapters, and has currently 10 patents issued or pending.

Dr. Xi-Wei Lin is currently Principal Design Engineer at Micron Technology Inc., designing CAM chips for telecommunication applications. He has spent more than 10 years in the semiconductor industry working on process development and physical design of high performance ASIC chips. His intimate knowledge of process and design gives him a unique perspective on how to successfully apply the latest technologies to chip design. Dr. Lin worked at Silicon Access Networks, Inc. as Principal Design Engineer, responsible for physical design of a 40M+ gate, 300MHz, 0.13 mm chip for advanced communication applications. Prior to that he held management and engineering jobs at LSI Logic and VLSI Technology. He holds nearly 30 U.S. patents and has more than 60 publications. Dr. Xie-Wei Lin received his M.S. and Ph.D. degrees in solid state physics from University of Paris at Orsay, France.

Dr. Pat Lindley has been at Charles Evans & Associates for 11 years, first as a TOF-SIMS analyst, now as Director, Organic & Microanalysis Services. At CEA, Pat has been involved in developing analytical methods to evaluate organic and inorganic contamination on materials used in the semiconductor, hard drive, biomedical, and polymer industries. Dr. Lindley received her PhD in organic chemistry from the University of Maryland.

Dr. Sergey Lopatin is a Director at KLA-Tencor Corporation in San Jose, CA. He collaborated with Stanford University on correlation of stress and texture evolution during self- and thermal annealing of electroplated Cu films, and evidence of dislocation loops as a driving force for self-annealing. Dr. Lopatin co-authored with Stanford University two papers which received best paper awards at IITC in San Francisco in 2000 and 2001. His research interests include electrochemical science of electroless deposition with surface activation, ALD metallization of nanostructures, self-assembly for IC and MEMS, superconductive thin films. Dr. Lopatin received his M.S., Ph.D. degrees in Electrical Engineering from Minsk Radioengineering Institute in 1988 and 1994, respectively. His Ph.D. thesis was on electroless metal deposition. In 1988 he joined Integral Semiconductor in Minsk where he worked on silicide integration and IC devices for Russian Institute of Space Explorations, Moskow, and TV Institute, St. Petersburg. From 1992 to 1994 he was a Research Associate at the National Academy of Sciences working on laser ablation of superconductors, vacuum laser lithography and diamond-like films. In 1994 he joined the Belorussian University of Computer Science and Radioelectronics where he supervised students on microwave devices and thin film detectors using electrochemical methods. In 1996 he joined Cornell University as Visiting Scientist where he investigated electroless damascene technology. He pioneered electroless metallization of nanostructures used in single crystal silicon MEMS. From 1997 to 2003 he was at Advanced Micro Devices where he led electrochemical work on dual damascene Cu interconnects. He presented short course on Cu electroplating at University of California at Berkeley. In 2003 he worked at Applied Materials where he led electroless program. In 2004 he joined KLA-Tencor as Director working in product engineering and new business development. Dr. Lopatin has authored and co-authored approximately 200 publications including 84 granted patents in the USA. He authored review article in a book, and co-authored book chapter.

Prof. Mark Lundstrom is Professor of Electrical and Computer Engineering at Purdue University where he has also served as Assistant Dean of Engineering and Director of the Optoelectronics Research Center. His bachelors and masters degrees are from the University of Minnesota and his Ph.D. from Purdue University. Before joining Purdue, he worked at Hewlett-Packard Corporation on integrated circuit process development and manufacturing. His teaching and research center on the physics, technology, and simulation of nanoscale electronic devices. Lundstrom is a Fellow of the IEEE and the APS, and his work has been recognized by the ASEE Terman Award and, with his colleague, Supriyo Datta, the IEEE Cledo Brunetti Award

Dr. Lori McCaig has been with Charles Evans & Associates since 1996. At CEA, Lori has worked in several analytical techniques, including Glow Discharge Mass Spectrometry (GDMS), Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS), dynamic SIMS, and Total Reflection X-Ray Fluorescence (TXRF). She is currently the manager of the Surface Metals/B Bulk/XRF group. She is also CEA’s quality manager responsible for the ISO 9000 program. Prior to coming to CEA, Lori worked in analytical positions within food, glass/plastics, and consumer products industries. Lori received her Ph.D. in Analytical Chemistry from the University of Michigan.

Dr. James McVittie has worked over 30 years on devices and processing. He received BS at University of Illinois and MS & PhD at Stanford University, all in electrical engineering. He has worked at MIT Lincoln Labs, Xerox PARC, and Stanford IC Lab in the EE Dept. He has been at Stanford for 20 years, in charge plasma equipment in the IC Lab. He has supervised 20 PhD dissertations in area of plasma technologies. He has well over 100 publications in area of plasma processing and has developed many test structures, plasma probes and models. Dr. McVittie has extensive hands-on experience in processing, equipment and modeling. He has successfully completed many pioneering experiments and models in plasma charging.

Anne Miller had been the product marketing manager of the Wafer Inspection Division of KLA Instruments Corporation. Before that she was the product manager for the Semiconductor Equipment Division of Cambridge Instruments. As one of the pioneers in the development of pellicles, Ms. Miller founded Micropel, a subsidiary of EKC Technology. Other experience was gained as a process engineer at Intel Corporation, and product development manager at JASCO Chemical Corporation. Before entering the semiconductor industry, Ms. Miller was a lecturer in the Chemistry Department at San Jose State University. She holds a junior college teaching credential in industrial technology, seventy post-graduate units in Business and Chemistry, and a B.S. degree in Chemistry. Ms. Miller has been a member of "Who¹s Who in the West" for many years.

Gary Mount is a Senior Specialist in SIMS at Charles Evans & Associates, with significant experience in both quadrupole and magnetic sector SIMS. He received his B.E.Sc. from the University of Western Ontario in 1983, his Professional Engineer’s license in 1985, and a M.E.Sc. from the University of Western Ontario in 1993. He has published a number of papers and has presented at many international conferences.

Prof. Charles Musgrave is an Assistant Professor of Chemical Engineering and Materials Science & Engineering Departments at Stanford University. He received his Ph.D. degree from California Institute of Technology in 1994. Prof. Musgrave was the winner of the First Feynman Prize in Nanotechnology in 1993 and was a Charles Powell Fellow between 1996 and 1999. Prof. Musgrave’s research areas include molecular simulations of semiconductor processing. His research involves atomistic simulations of reactions relevant to the processing of semiconductor materials, including prototyping nanoscale devices using atomistic simulations.

Dr. Somnath Nag holds a Ph.D. in Solid State Science, MS in Materials Science, and B.Tech in Metallurgical Engineering. He is currently the Director for Module Applications Development at KLA-Tencor. Prior to this, Dr. Nag has held several positions with management and technology development responsibilities in the semiconductor capital equipment industry including Torrex Corp. (acquired by Applied Materials) and Novellus Systems. Earlier, he was Projects Manager and Member of Technical Staff at Texas Instruments? Semiconductor Process and Device Center (SPDC) and started his career at TI?s Houston wafer fab. He has been closely associated with low-k technology since its introduction, including overall responsibility for development of carbon-doped oxides at Novellus. He has several patents and publications in the area of microelectronics thin films and integration.

Prof. Andrew R. Neureuther is a Professor of Electrical Engineering and Computer Science (EECS) at the University of California, Berkeley. Prof. Neureuther received his B.S., M.S., and Ph.D. degrees in Electrical Engineering from University of Illinois, Urbana Illinois, in 1963, 1964, 1966, respectively. Prof. Neureuther joined the Department of Electrical Engineering and Computer Sciences, University of California, Berkeley as a faculty member in 1966 where he is the Conexant Systems Distinguished Professor. His initial research was on integral equation methods for analysis of antennas and diffraction gratings. His main area of research has become computer-aided modeling of lithography and semiconductor fabrication processes. The latter began in 1972 through an industrial leave at the IBM T. J. Watson Research Center to work on photoresist modeling with Dr. F.H. Dill. With Professor W.G. Oldham, he then developed the user oriented computer programs for Simulation And Modeling of Profiles in Lithography and Etching (SAMPLE). The need to understand and control processes in the semiconductor industry provided the motivation, relevant applications and financial support to further extend this work through consortia and projects with the Semiconductor Research Corporation and DARPA. Recently, he also served as Associate Chair of his Department (1996-1999) and as Chair of the Applied Science and Technology Graduate Group (2000-2002). Prof. Neureuther has pioneered modeling and simulation of integrated circuit processing for many physical process effects as well as the use of these tools to explore innovation and manufacturing issues in emerging technologies. His work includes models for chemically amplified imaging materials (STORM), simulation of optical, electron, ion beam and x-ray lithography (SAMPLE), assessment of residual effects of defects and lens aberrations (SPLAT), electromagnetic scattering (TEMPEST), time-evolution of topography (SAMPLE3D), environments for integrating simulators with process flow (SIMPL) and remote web-based simulation (LAVA).

Wesley Nieveen graduated from Northwestern University with a M.Sc. in Materials Science and Engineering. He has also received a B.S. in Physics at the University of Nebraska. Prior to joining CE&A, he was responsible for establishing and managing centralized research facilities to support science and engineering departments at several universities. He has experience as a lecturer, conference chair, and invited speaker at many conferences. Wesley is currently a Scientific Fellow at Charles Evans & Associates, primarily in the ESCA/XPS group.

Prof. Yoshio Nishi is the Director of the Stanford Nanofabrication Facility and a Research Professor in the Department of Electrical Engineering at Stanford University. Dr. Nishi received his B.S. degree in metallurgy from Waseda University in 1962 and his Ph.D. degree in electronics engineering from the University of Tokyo in 1973. In 1962 he joined Toshiba Corporation where he worked on silicon process research and development. From 1968 to 1969 he was a Research Associate at the Stanford Electronics Laboratories, working on high-field transport in semiconductors and materials characterization of GaAs. In 1969 he rejoined Toshiba and supervised the nonvolatile memory R&D activity working on development of the world's first MNOS nonvolatile static memories. In 1976 he was responsible for theoretical and experimental studies of short-channel MOSFETs in the MITI VLSI project, as well as management of the SOS technology group at Toshiba. In 1979 he directed work on VLSI process technology, R&D memory and logic VLSI. In 1986 he joined HP Labs as Director of the Silicon Process Laboratory where he built HP's first converged CMOS technology at 0.8 micron geometry used in HP RISC Processor, PA-RISC chip sets. In 1994, he established and became Director of the ULSI Research Laboratory. Dr. Nishi joined Texas Instruments in 1995 as Vice President and Director of Research and Development for the Semiconductor Group. In 1996, he was appointed Senior VP, responsible for R&D activities for digital signal processing solutions, semiconductor processes and devices, memory, as well as components and materials. Dr. Nishi has published over 125 papers in international technical journals and conferences, and has co-authored nine books. He has been awarded more than 50 patents in the U.S. and Japan. He is a Fellow of the IEEE; a member of the Japan Society of Applied Physics; Institute of Electronics, Communication Engineers of Japan; and the Electrochemical Society. He received the IECE Japan Award in 1972, IR100 awards in 1982 and 1986 for nonvolatile memory productization. In 1995, he received the IEEE Jack A. Morton Award. He is also the 2002 Robert Noyce Medal recipient.

Dr. Kamel Ounadjela is senior director at Cypress Semiconductor conducting the effort in the MRAM technology. He specializes in magnetic devices, electrical transport and magnetic materials preparation. He authored about 150 papers in journals, proceedings and conferences. He wrote chapters in three books, one mainly devoted to mesoscopic magnetism in MRAM devices. He taught several invited lectures on Magnetism in international conferences worldwide. Prior to Cypress, he was director of research at the CNRS in France where he headed a group of researchers working in magnetic nanostructures. He has successfully collaborated with a number of research groups and industries worldwide. He lead a number of international projects granted up to several million dollars. From 1999 to 2001, he was chief technologist for MRAM at Veeco Instruments where he worked on process/device deposition tool integration, modeling and optimization.

Dr. Ajit Paranjpe is Vice President and Chief Technical Officer of Torrex. He has over twelve years of experience in microelectronics fabrication. Recently he was Director of Process Technology and Applications Engineering at CVC, Inc where he managed process technology development and customer demonstrations in support of CVC’s PVD, CVD, IBD & IBE product lines. Prior to CVC, he developed equipment, sensor & process technology for the MMST single wafer factory program at the Semiconductor Process & Device Center of Texas Instruments. He has extensive experience in process development and integration related to the fabrication of semiconductor, opto-electronic & magnetic thin film devices. He has co-authored over 30 publications and holds 22 patents. He has a B.Tech. degree from the Indian Institute of Technology, and an M.S. and Ph.D. from Stanford.

Prof. Byung Gook Park is an Associate Professor at the School of Electrical Engineering at Seoul National University. He received his B.S. and M.S. degrees in Electrical Engineering from Seoul National University, and his Ph.D. degree in Electrical Engineering from Stanford University. Prior to joining the faculty of Seoul National University, Prof. Park worked at AT&T Bell Laboratories, and Texas Instruments. Prof. Park’s research interests include nanoscale CMOS and quantum effect devices.

Dr. Stuart Parkin joined IBM Research in San Jose in 1982 as a World Trade Post-doctoral Fellow, becoming a permanent member of the staff the following year. His current work involves the study of magnetic tunnel junctions and the development of an advanced non-volatile magnetic random access memory based on magnetic tunnel junction storage cells. His earlier research interests have included organic superconductors, ceramic high temperature superconductors and, most recently, the study of magnetic thin-film structures and nanostructures exhibiting giant magnetoresistance (GMR). In 1991, he discovered oscillations in the magnitude of the interlayer exchange coupling in transition-metal magnetic multilayered GMR systems. For this and related work, Dr. Parkin shared both the American Physical Society’s International New Materials Prize (1994) and the European Physical Society’s Hewlett-Packard Europhysics Prize (1997). Dr. Parkin has received other awards including the Materials Research Society Outstanding Young Investigator Award (1991), the Charles Vernon Boys Prize from the Institute of Physics, London (1991), the 1999-2000 American Institute of Physics Prize for Industrial Applications of Physics, as well as several awards from IBM. This year Dr. Parkin was named R&D Magazine’s first Innovator of the Year. A native of the United Kingdom, Dr. Parkin received his B.A. degree (1977) and was elected a Research Fellow (1979) at Trinity College in Cambridge, England, and was awarded his Ph.D degree (1980) at the Cavendish Laboratory, also in Cambridge. Dr. Parkin was elected a Fellow of the Royal Society in 2000 and is also a Fellow of the American Physical Society and the Institute of Physics (London). In 1997, he was elected a member of the IBM Academy of Technology and named an IBM Research Master Inventor. In 1999 he was appointed an IBM Fellow, IBM’s highest technical honor.

Prof. R. Fabian Pease is the William Ayer Professor of Electrical Engineering at Stanford University. His group's areas of research include micro- and nano-fabrication and their application to electronic and magnetic devices and structures. This work has included the original demonstration of lithography with the scanning tunneling microscope, exploring the limits of resolution of deep ultraviolet lithography, the invention of the micro-channel heat sink and non-conventional electron beam technology for semiconductor manufacturing. R. Fabian W. Pease served as a radar officer in the Royal Air Force from 1955 to 1957, and received his B.A., M.A., and Ph.D. degrees from Cambridge University in 1960, 1962, and 1964, respectively. His Ph.D. thesis was on High Resolution Scanning Electron Microscopy. After graduating, he was an Assistant Professor of Electrical Engineering at UC Berkeley for three years, where he continued his microscopy research. In 1967, Dr. Pease joined the technical staff of Bell Laboratories, where he first worked on digital television and later led a group that developed the processes for electron beam lithographic mask manufacture, and demonstrated a pioneering LSI circuit built with electron beam lithography. Since 1978 he has been a Professor of Electrical Engineering at Stanford University. On sabbatical in 1993 and 1994, Dr. Pease conducted research on the synthesis of DNA microarrays at Affymetrix Corporation. From 1996 to 1998, he was assigned to the Defense Advanced Research Projects Agency, where he initiated programs in Advanced Microelectronics and in Molecular-Level Printing. Dr. Pease was appointed the William E. Ayer Professor of Electrical Engineering in March 2001. He is a Fellow of the IEEE, and has served the IEEE in a variety of capacities. He is also a member of the National Academy of Engineering. He has published over 200 articles and authored several book chapters.

Prof. Ara Philipossian received his B.S., M.S. and Ph.D. degrees in Chemical Engineering from Tufts University in 1983, 1985, and 1992, respectively. Since 2000, he has been an Associate Professor of Chemical Engineering at University of Arizona (sponsored by Intel's Researcher-In-Residence program) teaching graduate & undergraduate courses in the area of fluid flow, heat transfer and IC processing. From 1992 until 2000, Dr. Philipossian was Materials Technology Manager at Intel Corporation responsible for development, characterization, implementation and sustaining of new and existing CMP and post-CMP cleaning consumables, low k dielectrics and electroplating chemicals. In addition to his responsibilities at the University of Arizona, he is the Lufkin Visiting Professor of Mechanical Engineering at Tufts University. From 1986 to 1992, Dr. Philipossian was employed at Digital Equipment Corporation as a process development group leader focusing on thermal silicon oxidation, diffusion, LPCVD of dielectric and gate electrodes, and wafer cleaning technology. Dr. Philipossian has authored 35 journal publications, and 60 articles in conference proceedings. He holds 12 patents in the area of semiconductor processing and device fabrication.

Prof. Kristofer S.J. Pister received his B.A. in Applied Physics from UCSD in 1982, and his M.S. and Ph.D. in Electrical Engineering from UC Berkeley in 1989 and 1992. From 1992 to 97 he was an Assistant Professor of Electrical Engineering at UCLA, where he developed three graduate level courses in Micro Electro Mechanical Systems: MEMS device physics and fabrication, MEMS system design, and CAD for MEMS. In 1996 he joined the faculty of Electrical Engineering and Computer Sciences at UC Berkeley as an Associate Professor. From 1996 to 1999 he was a member of the DARPA ISAT group, and in 1997 he was chosen to be a part of the Defense Science Study Group. During the last five years, his primary research interest has been the development and use of standard MEMS fabrication technologies, micro robotics, and CAD for MEMS. He is the inventor of the polysilicon hinge, now in use by many MEMS groups around the world. Most recently his work has been in wireless sensor networks and micro optics. He is an active consultant in the MEMS industry, and has two patents on MEMS technology and applications.

Dr. Dipu Pramanik has spent more than 20 years in the semiconductor industry in a career that has spanned process development, device and circuit simulation, physical design of digital circuits , RF and analog design and wireless systems design. The breadth of his experience allows him to explain how scaling trends, quantified by Moore’s Law, affect the overall design of products fabricated in the latest technologies. He has held senior management positions at VLSI Technology. He was cofounder and VP of Engineering of Virtual Wire, a firm focused on wireless chips. Dr. Pramanik is currently involved with Technology Strategy at Numerical Technologies. He has 30 issued patents and has more than 70 publications. He has been an instructor at UC Berkeley Extension for more than 15 , teaching courses on process and physical design. He has a Ph.D. degree from Cornell University.

Susanne Preiss Jahrgang 1967, hat nach dem Betriebswirtschaftsstudium in der Werbung als Kundenberaterin und später alsEtatdirektorin gearbeitet. Gestresst vom Leben in der Werbung, lernte Sie bei einem alten Meister in Shanghai die Lehre des Qi Gong und gründete nach 7 Auslands-Jahren in Südamerika und Asien SHENZAI, THE QI GONG COMPANY. Heute lebt sie in der Nähe von Hannover und ist in Deutschland eine der anerkanntesten Trainerinnen für Stressmanagement und Qi Gong und arbeitet seit Jahren erfolgreich mit Führungskräften aus Top- und Middlemanagement , Politikern, Moderatoren, Selbständigen zusammen.

• Bekannt wurde die Arbeit von Ihr durch die ungewöhnliche Namensgebung, als Sie im Jahre 2000 anfing in sogenannten Entschleunigungs-Kursen mit Führungskräften aus ganz Europa ein Programm zum Stressabbau und zur Erholung, an Wochenenden und 4-Tages-Workshops zu entwickeln.
  
  
• Sie arbeitet als Body & Mind Expertin für den Robinson-Club, ist Dozentin und Trainerin bei Europas größtem Fortbildungs-Institut für Führungskräfte CEGOS Swiss AG, arbeitet als Expertin für die NetSkill AG, einem Spinn Off der Fraunhofer Gesellschaft und bildet Fitness-Trainer aus für Fleesensee Spa und Travel Charme Hotels. Große Firmen, wie LOREAL, eine namenhafte Brauerei, Gehrke Unternehmensberatung, etc. lassen ihre Führungskräfte bei ihr zur Ruhe kommen. Sie ist die Europa Repräsentantin des„ Chinese Nature Cure Institutes“ von Professor Dr. Tee Tong Ang aus Singapur.
  
  
• Im ZDF erschien in einer Sondersendung zum Tag der Arbeit am 1.Mai 2004 ein Beitrag über Ihre Arbeit mit dem Thema „Die Zeitraffer – wieviel Feierabend braucht der Mensch?“ Zahlreiche redaktionelle Beiträge berichteten die letzten drei Jahre über die Erfolge der Führungskräfte mit dem Programm.
  
  
• (www.shenzai.com)

EDAC Presentation

Prof. Hans J. Queisser is a retired director of the Max-Planck-Institute for Solids in Stuttgart. He obtained his Ph.D. in physics at Goettingen in 1958, then joined Shockley Transistor Corporation in Mountain View, where he worked on crystal growth, epitaxy, diffusion, lattice defects, junction properties and solar cells. From 1964 to 1966, he did research on GaAs optoelectronics at Bell Labs. After a professorship at Frankfurt, he was asked to be a founding director of the new Max-Planck- Institute for Solids. He was president of the German Physical Society, adviser to the German Federal government and the World Bank. He serves on several industrial boards, including Robert Bosch Inc., Hewlett-Packard and Scientific American. He is presently a visiting professor at U.C. Berkeley.

Prof. Srini Raghavan is a Professor of Materials Science and Engineering at the University of Arizona in Tucson. He obtained his Ph.D. in Materials Science and Mineral Engineering from the University of California at Berkeley in 1976 and has been on the faculty of University of Arizona since 1978. He teaches classes in applied surface chemistry, corrosion and degradation of materials, and physical chemistry of materials. His research interests are in the areas of wet processing of silicon, micro-contamination, chemical mechanical polishing and applied electrochemistry. He is associated with the Center for Micro-contamination Control and the NSF-SRC Center for Environmentally Benign Semiconductor Manufacturing at the University of Arizona. He has published more than 80 technical papers and has three patents to his credit.

Ms. Karen A. Reinhardt is a Member of the Technical Staff at Novellus Systems in San Jose, California. In this role she is responsible for investigating and assessing new and unique cleaning technologies that will allow realization of the ITRS roadmap with respect to smaller geometries, new materials, and the environmental issues associated with current cleaning processes. Karen joined Gasonics in 1998 as the Process Development Manager working on plasma and high pressure cleaning techniques. In 2001 Gasonics was acquired by Novellus Systems, Karen continued her role in the development of cleaning technologies. Prior to working in the equipment industry, Karen worked at AMD and Cypress in various process development and device integration roles. Karen received her BS degree in Chemistry from the University of California at Riverside and her MS degree in Inorganic Chemistry from Texas Tech. Karen has published numerous technical papers ranging from plasma processing to damage characterization and cleaning technology assessment. She has been awarded four patents.

Bruce Rothman has been with Charles Evans & Associates since 1996. At CEA, Bruce has worked in the Accelerator Techniques Group. He is currently the team leader of the Accelerator Techniques Group. Prior to coming to CEA, Bruce worked in the Laboratory for Research on the Structure of Matter at the University of Pennsylvania, where he also received his B.A. in Natural Science.

Prof. Gary Rubloff

Prof. Krishna C. Saraswat received the B.E. degree in electronics and telecommunications in 1968 from Birla Institute of Technology and Science, Pilani, India, and the M.S. and Ph.D. degrees in Electrical Engineering in 1969 and 1974 respectively from Stanford University, Stanford, CA. From June 1969 to December 1970, he worked on microwave transistors at Texas Instruments, Dallas, Texas and since January 1971, he has been with Stanford University, California, where presently he is a Professor of Electrical Engineering and Associate Director of the NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing. His group is working on a variety of problems related to new and innovative materials, device structures, and manufacturing technology of silicon devices and integrated circuits. He has authored or co-authored over 300 technical papers and graduated more than three dozen doctorate students. Special areas of his interest are thin film MOS transistors (TFTs) on insulator for 3 dimensional multilayer ICs and flat panel displays; thin film technology for VLSI interconnections and contacts; process and equipment modeling; ultra thin MOS gate dielectrics; rapid thermal processing; concepts of flexible manufacturing of ICs; and development of tools and methodology for simulation and control of a microelectronics manufacturing. His group has developed several simulators for process, equipment and factory performance simulations, such as, SPEEDIE for etch and deposition simulation, SCOPE for IC factory performance simulations and a thermal simulator for RTP equipment design. Currently he is also involved in the development of BEST (Beck-End Simulation Tool), an interconnect process simulator.

Prof. Saraswat is a Fellow of IEEE, member of The Electrochemical Society, The Materials Research Society and The Society for Information Display. He was co-editor of the IEEE Transactions on Electron Devices during 1988 - 1990. He has authored or co-authored over 330 technical papers.

Ph. D. Richard Savage

• 20+ years in high-tech industries, including two startups and executive positions managing engineering & technology groups in large corporations
• Associate Professor, Cal Poly State University
• Vice President, Physical Electronics / Charles Evans Analytical
• Chief Technical Officer, Olympus
• Vice President, Silicon Valley Group / Watkins Johnson
• Founder & President, SC Technology & PT Analytical
• General Manager, Plasma-Therm, Inc.
• Staff Scientist, Perkin-Elmer Optical & Instrumentation Laboratories, Inc.
• 8 US Patents, 30+ Technical Publications and Presentations
• Ph.D. Analytical & Physical Chemistry, Indiana University, IN 1979
• Research Interest: Microsystems for exploring Nanotechnology

Dr. Arthur Sherman is a Consultant in Menlo Park, California. He has also been active in theoretical and experimental studies of chemical vapor deposition (CVD) for a number of companies, including Varian associates, Novellus Systems, Applied Materials, and Watkins Johnson. He was one of the first to formulate mathematical models of CVD reactors, and also demonstrated that thin films of titanium nitride could be deposited at moderate temperatures from titanium tetrachloride and ammonia in a low-pressure, cold-wall CVD reactor. Prior to his research in CVD, he worked on the development of color TV picture tubes at RCA, and did extensive research in magnetohydrodynamics at General Electric. He was a Guggenheim Fellow at Princeton University, where he studied aerodynamics, and later received his Ph.D. from University of Pennsylvania. He has published extensively, and is the author of more than 50 papers and three texts, Engineering Magnetohydrodynamics, Chemical Vapor Deposition for Microelectronics, and Atomic Layer Deposition (in press). He is also the holder of 6 patents. Dr. Sherman can be reached at esclamp@aol.com.

Prof. Robert Sinclair is a Professor of Materials Science and Engineering at Stanford University. He received his B.A. in Materials Science from Cambridge University in1968, and his M.A. and Ph.D. degrees in Materials Science, also from Cambridge University in 1972. His research interests include high-resolution electron microscopy, interface structure and phase transformation in solids and magnetic materials.

Dr. Robert J. Small is the research director of the R&D group at EKC Technology. He is involved in developing new chemistries for post etch residue removal, post CMP cleaning and new CMP chemistries. Bob has BS from Norwich University, an MS from Texas Tech University, and a Ph.D. in organic photochemistry from the University of Arizona. He received the first Technical Catalyst Award from First Chemical Corp in 1994. He has co-authored nearly 60 articles and presentations including post CMP and CMP and holds more than sixteen U.S. and foreign patents and have six submitted patent applications.

Dr. Robert Socha is an Imaging Scientist in the Technology Development Center of ASML. Dr. Socha received his B.S. degree in electrical engineering from University of Michigan in 1991 and his Ph.D. degree in electrical engineering from the University of California at Berkeley in 1997. At the University of California at Berkeley, his studies concentrated on optical lithography under the direction of Prof. Andrew Neureuther. In 1997, he joined National Semiconductor and worked on optical lithography resolution enhancement techniques such as optical proximity correction (OPC) and phase shift mask (PSM). In 1999 he joined ASML where he works with customers to help them use ASML lithography equipment more effectively. Dr. Socha uses various resolution enhancement techinques to achieve the smaller resolution. These resolution enhancement techniques include mask OPC, phase shift mask, off axis illumination, and mask-illumination optimization. In addition to helping customers with resolution enhancement techniques, Dr. Socha also uses his background in modeling and coding to produce resolution enhancement software with ASML Masktools.

Dr. Socha has published 25 papers in international technical journals and conferences, and is currently working on a book for mask resolution enhancement techniques. He has been awarded 5 patents internationally. He is a member of SPIE and a member of the IEEE. In 1992 he was awarded a National Science Foundation Graduate Fellowship and in 1996 he was awared a Semiconductor Research Corporation Graduate Fellowship.

Prof. Olav Solgaard has been a member of Electrical Engineering faculty at Stanford University since 1999. Prof. Olav Solgaard received his B.S. in electrical engineering from Norwegian Institute of Technology in Norway, and his M.S. and Ph.D. degrees both in electrical engineering from Stanford University. His Ph.D. thesis was on "Integrated Semiconductor Light Modulators for Fiber-Optic and Display Applications" which consisted of development of light modulators for integration of fiber optics with semiconductor electronic circuits, and included his invention of the Deformable Grating Light Valve. In 1994, he co-founded Silicon Light Machines where he has served as a consultant and Technology Advisory Board member. He was a post-doctoral research engineer at University of California, Berkeley, between 1992 and 1995. He was an Assistant Professor of Electrical and Computer Engineering at University of California, Davis, between 1995 and 1999. Prof. Solgaard's research interests include fabrication technology for micro-optical devices and systems, optical communication and sensing, and microphotonics.

IMEC Staff is a world-leading independent research center in nanoelectronics and nanotechnology. Its research focuses on the next generations of chips and systems, and on the enabling technologies for ambient intelligence. IMEC's research bridges the gap between fundamental research at universities and technology development in industry. Its unique balance of processing and system know-how, intellectual property portfolio, state-of-the-art infrastructure and its strong network of companies, universities and research institutes worldwide, position IMEC as a key partner with which to develop and improve technologies for future systems. IMEC is headquartered in Leuven, Belgium and has representatives in the US, China and Japan. Its staff of more than 1300 people includes over 400 industrial residents and guest researchers. In 2004, its revenues were EUR 159 million. Further information on IMEC can be found on http://www.imec.be/wwwinter/mediacenter/en/Jaarcijfers.shtml and www.imec.be.

Jason Stinson is a principal engineer in the Enterprise Processor Division at Intel Corporation. He received his B.S. and M.S. degrees in electrical engineering from Stanford University in 1990 and 1991, respectively. In 1992, he joined Intel Corporation in the Microprocessor Design Division, working on the design of the original Pentium® Processor. For the past twelve years, Jason has been part of various microprocessor design projects at Intel, including the Pentium II Processor, Mobile Pentium II Processor and Celeron® Processor. During this timeframe, he has split his time between design methodology and post-silicon validation. In the area of design and design methodology, Jason has been responsible for dynamic circuits, clocking, signal integrity and timing analysis on various projects. In the area of post-silicon validation, Jason’s expertise areas are primarily in marginality validation and frequency debug.

For the past four years, Jason has been the circuit technical lead for the 0.13um Itanium® 2 Processor, responsible for both the global design methodologies as well as post-silicon validation.

Jason has authored 10 papers in refereed conference and technical journals. He has been awarded 3 US patents. Additionally, Jason has taught classes in advanced digital design at Stanford University and post-silicon validation at international conferences.

Bert Van Thielen

Year of birth: 1978

He got his degree of Master in Electronics Engineering in 2000. That same year he joined Imec as ASIC design engineer. Being part of the CAD group, he gained experience in the development of complex digital systems, using VHDL and best-in-class design tools. He developed the SystemC course, together with Geert Vanwijnsberghe. The course has been schedule for 10+ times to an international audience of hard- and software designers from industry and research institutes, as well as to teaching and research staff from international academia.

Dr. Chiu Ting is currently serving as a Director of Blue 29, Inc. (now an ECD division of KLA Tencor) and a consultant to the semiconductor industry. Dr. Ting has held industrial positions at various companies in the semiconductor industry, including: IBM (East Fishkill, Yorktown Heights, and San Jose), Intel Santa Clara, and Advanced Micro Devices (AMD) Sunnyvale. Dr. Ting received his B.S.from UC Berkeley, as well as his M.S. and Ph.D. degrees from Stanford University, all in Electrical Engineering. Dr. Ting has produced over 100 publications including 15 issued patents. Dr. Ting is a world-renowned expert in integrated circuit interconnect technologies as well as electrochemical deposition (ECD) processes and applications.

Mr. Helmuth Treichel studied chemistry at the Academy Of Sciences and Technics/ Isny (Germany)from 1983 to 1986. In 1986, he graduated as a chemical engineer on the topic: "Selective Deposition of TaSi2". Since early 1986, he was working as development engineer for CVD-processes at SIEMENS (Munich). From 1986 to 1988, his main fields were oxide deposition processes based on TEOS-chemistry (e.g. AsSG, BSG, BPSG, hotwall-CVD) for DRAM production. In 1988, he focussed his activities on PECVD-processes (oxides, nitrides) for DRAM and logic applications, including the evaluation of the principle of molecular engineering (monomolecular precursors). The characterization of alternative dielectrics (BN, SiBN, and Ta2O5) was part of his work. Another field of interest has been the development of CVD-processes for conductive materials such as Ti, TiSi2, TiN, Al or Cu.

In 1992 H. Treichel joined the collaborative venture between Siemens and IBM, Vermont and France as a team member developing a standardized 16Mbit DRAM for external distribution. From 1994, after leaving Siemens, he became manager for the Multilevel Metallization Group and Project Officer "Smart Fabrication" at the Fraunhofer Institute for Solid State Technology, Munich, Germany. H. Treichel was Manager of the pilot production of ASICs at the Fraunhofer Institute for Solid State Technology, Munich Germany (2/1996 to 8/98). After moving to the USA in September 1997, he took over the position as Sr. Manager of Applications Engineering at Lam Research Research's CMP/Cleaning division. His current position is Director Process Technology, New Products at Novellus Systems, San Jose. H. Treichel collaborated on 22 different patents, presented more than 30 invited and contributed lectures, and published more than 45 papers worldwide.

Peter Van Zant has career that spans over thirtyfive years in various disciplines of the semiconductor industry. His experience includes process development and engineering, management, start up of three companies, sales and marketing, college instruction, development and presentation of training programs, consulting in the areas of product marketing, wafer fabrication processing, training and support of the legal profession. He is the author of a number of industry specific texts and articles, including the popular Microchip Fabrication. Mr. Van Zant holds a degree in physics from Marist College in Poughkeepsie, New York. He is a past director of Semicon Tools Inc., Bjorne Enterprises, The Nevada County Business Association, and EKC Technology Inc. He is active in community affairs and was elected a Nevada County (CA) supervisor in 1995.

Geert Vanwijnsberghe

Year of Birth: 1961

Nationality: Belgian

Education:

1984: Electrical Engineering degree from the Katholieke Universiteit Leuven, Belgium.

Function:

Project engineer SOC design in the Invomec division of IMEC

Experiences:

1986 - 1990: Joined Imec in 1986 as a CAD support engineer. He was responsible for the support in all aspects of digital ASIC design mainly for the polytechnic schools and universities in Flanders.

1990 - 2002: Since 1990 he was involved in the design of several digital ASICs in close cooperation with industry. A typical example was the development of a hearing implant. As a VHDL expert he also designed ASICs for the European Space Agency. From 1998 to 2002 he worked in a team developing flexible OFDM tranceiver ASICs for wireless LAN using C++ as high level hardware description language.

2001 - now: Based on the VHDL and C++ experiences he developed a SystemC course. Since then he is teaching this course a few times a year . The last years his interests have also moved to the design of combined hardware-software systems.

John Wuu is a Senior Member of Technical Staff at Advanced Micro Devices. He started in the field of SRAM design in 1996, when he designed scalable SRAMs for his M.Eng. thesis at Intel Corporation. After receiving his B.S. and M.Eng. from MIT in 1997, he joined Hewlett-Packard Company, designing L3 caches for several generations of Itanium® 2 processors. The 24MB L3 cache for the 90nm Itanium 2 processor remains as the largest embedded cache published to date. John was acquired by Intel in 2005 as part of the Itanium team divestiture, and joined AMD in 2006.

While at HP and Intel, John designed and taught a VLSI design course for advanced high school students. The course covered basic EE, digital design, device physics, VLSI design, and mask design in one semester. Top students received the opportunity to interview for and secure internship positions with HP and Intel.

John has authored several papers in the field of SRAM design, and has more than 10 patents granted or pending.

Ph. D. Hong Xiao
Hong Xiao is a Sr. process engineer in Motorola Semiconductor Production Sector. He was an associate professor of ACC in Semiconductor Manufacturing Technology (SMT) program, teaching semiconductor fabrication process, DC, AC circuits, and other courses.

He received his BS degree from the University of Science and Technology of China in 1982 and MS degree from Southwestern Institute of Physics in 1985. After four year theoretical and experimental researches in electron cyclotron resonance (ECR) plasma heating in China National Nuclear Corporation, he went to The University of Texas at Austin in 1989 to pursue the doctoral degree in Department of Physics.

After receiving the Ph.D. degree in plasma physics in 1995, Dr. Xiao worked in Applied Materials as senior technical instructor in Semiconductor Process Training Department, expertise in dielectric thin film deposition, semiconductor process integration and plasma physics. Since fall 1998, Dr. Xiao started to teach in ACC while writing the book under contract with Prentice Hall and developing the professional training and presentation materials on semiconductor processing technology.

Dr. Xiao is the author of about 20 academic papers and a book titled Introduction to Semiconductor Manufacturing Technology, published by Prentice Hall in Dec. 2000.

Richard Yanda is a senior industry instructor with extensive experience in developing and delivering semiconductor-related courses. He served as manager as the Process Training Department at LAM Research where he developed the department curriculum and served as senior technical instructor. As founder of Semiconductor Technology Training, he developed specialized industry training courses. Earlier in his career, Mr. Yanda was senior process engineer at Advanced Micro Devices, Cypress Semiconductor and INMOS Corporation. He also held the position of senior process engineer at Lam Research at for Lam Research and Matrix Integrated Systems. Mr. Yanda holds a B.A. in Physics and has completed numerous post-graduate technical courses.

Robert Zeidman is the president of Zeidman Consulting (www.ZeidmanConsulting.com), a contract research and development firm. Since 1983, he has designed ASICs, FPGAs, and PC boards for RISC-based parallel processor systems, laser printers, network switches and routers, and other real time systems. His clients have included Apple Computer, Cisco Systems, Intel, Quickturn Design Systems, and Texas Instruments. Previously, Bob was the president of The Chalkboard Network, an e-learning company for high tech professionals. Among his publications are technical papers on hardware and software design methods as well as three textbooks -- "Designing with FPGAs and CPLDs," "Verilog Designer's Library," and "Introduction to Verilog.” He has taught courses at engineering conferences throughout the world. Bob earned bachelor's degrees in physics and electrical engineering at Cornell University and a master's degree in electrical engineering at Stanford University.